The company is a leading manufacturer of light sources used in lithography.

The new light source supports sub 10 nm lithography processes by further evolving the unsurpassed spectral control technologies.

It comes standard-equipped with environmental impact reducing technologies that include helium-free operation under all operating conditions and compatibility with the company’s neon gas recycling systems.

Regarding spectral control of the light source, it comes standard-equipped with two new technologies. The first is eMPL Solid, which improves spectral performance stability at a level 400% higher than with existing functionality. The technology achieves an impressively high level of spectral width stability or E95 at ±5 fm in each exposure field, contributing to improved uniformity in critical dimensions.

The other technology is hMPL, which controls E95 by keeping them between 200 and 450 fm. It contributes to maximizing the process window by optimizing E95 according to lithography process.

Hitoshi Tomaru, president and CEO of Gigaphoton said “Our new GT65A is one of the solutions we have made available to the semiconductor chip manufacturer that is ceaselessly engaged in the challenge of chip size shrinking. Gigaphoton is committed to continued investment in technology to improve lithography performance.”

The company's ArF excimer light sources, including the GT65A, will be unveiled at the upcoming international symposium on advanced lithography called SPIE Advanced Lithography 2017 which will be held from February 26 to March 2 in San Jose, California.